STVCR4160

4-Axis Cylindrical Coordinate Clean Robot

Features: Designed for handling wafers in the vacuum chamber of production line and inspection line.; Double payload and superior cost performance compared to STVHR series.; Compatible with STVHR series and it is possible to replace or upgrade into STVCR series.; Execution of origin search is not required by using the servo motors with absolute encoders.

STVCR4160

Magnetic fluid sealing and filter
Vacuum (Temp. 15°C to 50°C)
Driving unit：Clean room atmosphere (Temp. 15°C to 40°C)

50 mm

Below 2 kg (Caculated for the 3rd joint)

Designed for handling wafers in the vacuum chamber of production line and inspection line.

Double payload and superior cost performance compared to STVHR series.

Compatible with STVHR series and it is possible to replace or upgrade into STVCR series.

Execution of origin search is not required by using the servo motors with absolute encoders.

Magnetic fluid sealing is used for arm joint.

Vacuum sealing: Magnetic fluid sealing and bellows are used.

For cleanliness: 5µm mesh filter installed for exhaust ventilation in the arm.

Twin-arm reduces the wafer swap time.

Motion monitoring is available.

RS232C and parallel photo I/O are standard for control.

AC servo motors with absolute encoders installed in all axes.

High-speed, high-accuracy wafer handlingby S-curved speed control.

AC servo motor or 2-phase pulse motor type is selectable.

Wafer holding: end-effector with passive edge or edge grip type End-effector.

End-effector material: CFRP, Al, ceramic, or others.

Optimal end-effector is selectable according to the carrying object and line layout.

Robot Arm Model	STVCR4160-050-AM
Handled Object	Wafer up to 12 inches
Wafer Holding Method	By end-effector with passive edge or edge grip type end-effector
Mechanical Structure	4-axis Cylindrical coordinate type
Motor	AC servo motor
Operating Range	From the robot center to the wafer center: 600mm Rotation angle (θ axis): 330deg Vertical Stroke (Z-axis): 50mm
Carrying Speed	Arm (R-axis): 520mm/2.0sec Rotation (θ axis): 330deg/2.7sec Vertical Stroke (Z-axis): 50mm/1.5sec
Resolution	Arm (R-axis): Below 4.91µm Rotation (θ axis): 0.00088deg Vertical Stroke (Z-axis): 0.488µm
Repeatability	Within ±0.1mm
Cleanliness	Magnetic fluid sealing and filter
Vacuum resistance	1.33×10^-6Pa
Utility	Power: AC200V single phase ±10% 1kVA

＊Representative specifications of STVCR4160-050-AM.
It can be changed depending on the carrying object and end-effector type.

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